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20A 18V Electroplating Experiment Rectifier Full-Featured

  • Output: 0-18V DC / 0-20A Adjustable

  • Power: 360W

  • Purpose: Advanced Electroplating R&D

  • Best For: Alloy Plating Research, Process Optimization, Advanced Material Studies

    Electroplating Experiment Rectifier Introduction

    The 20A 18V electroplating experiment rectifier is a comprehensive research power system. This full-featured electroplating experiment rectifier delivers precise DC power with advanced control options. Consequently, it enables sophisticated research in alloy deposition, pulse plating, and process optimization.

    Experimental Rectifier Specifications

    ParameterSpecification
    Input Power220VAC Single-Phase, 50/60Hz
    DC Output Range0-18V / 0-20A
    Voltage Resolution1mV
    Current Resolution1mA
    Control InterfaceTouchscreen HMI with Data Logging
    Operating ModesCV, CC, Pulse, Programmable Ramp
    Special FeaturesWaveform Generator, Recipe Storage, USB Data Export
    CoolingAir Cooling
    ProtectionsOVP, OCP, OTP, Short Circuit

    Key Features of the Experiment Rectifier

    • Comprehensive Control: This electroplating experiment rectifier offers multiple operating modes. Therefore, researchers can conduct complex experiments including pulse plating and cyclic voltammetry simulations.
    • Precision Measurement: With 1mV/1mA resolution, the system provides exact parameter control. Moreover, integrated data logging captures detailed process information for analysis.
    • Advanced Programming: The touchscreen interface allows creation of multi-step experimental sequences. Consequently, users can automate complex deposition protocols for consistent results.
    • Research-Ready Design: Built specifically for laboratory environments, this experiment rectifier combines precision electronics with user-friendly operation. Additionally, its compact design fits easily on standard lab benches.

    Applications for the Full-Featured Rectifier

    This 20A 18V electroplating experiment rectifier supports advanced research across multiple disciplines.

    In Alloy Development Research, scientists use its precise control to study deposition kinetics. Specifically, they can optimize parameters for zinc-nickel, tin-cobalt, and other functional alloy systems.

    For Pulse Plating Studies, researchers employ the waveform generator to investigate different pulse patterns. Thus, they can determine optimal parameters for grain refinement and deposit properties.

    In Process Optimization Work, engineers utilize the programmable sequences to test various deposition strategies. As a result, they can develop optimized processes before scaling to production equipment.

    Ultimately, this full-featured rectifier provides the complete toolset needed for modern electroplating research. It enables scientific discovery while supporting practical process development from laboratory to production.

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